2024
▶"Advanced Polymer Dry Etching Processes for Enhanced Cu/Polymer Hybrid Bonding" (submitted)
▶"Ultra-Low-Temperature Deposition and Enhanced Bonding of SiCN Films for Advanced 3D Integration" (submitted)
▶"Reducing Interface Resistance in Semiconductor System through the Integration of Graphene" (submitted)
▶"Analysis of Signal Transmission Efficiency in Semiconductor Interconnect and Proposal of Enhanced Structures" (submitted)
▶"Improving Z-Interference and Program Disturbance in 3D NAND Flash Memory Using Asymmetric Program-Pass Voltage" (submitted)
▶"Unveiling Parasitic Capacitance Effects and Introducing Buried Structure for Enhanced RF Performance in 2-D Channel Devices" (submitted)
▶"Improving Cell Current in 3D NAND Flash Memory with Fixed Oxide Charge" (submitted)
▶Jihun Kim and Jong Kyung Park*, "The Polymer bonding for low-temperature Cu Hybrid Bonding", Journal of the Microelectronics and Packaging Society. vol. 31, no. 3, pp. 1–9, 2024.
▶Seung Won Lee, Hak Jun Ban, Jong Kyung Park, Dong Jin Ji and Seul Ki Hong, “Analyzing the Influence of Source/Drain Growth Height and Lateral Growth Depth in FinFETs through XGBoost and SHAP”, IEEE Electron Device Letters, Accepted, 2024.
▶Yujin Choi, Seoul Ki Hong, and Jong Kyung Park*, "Innovative Programming Approaches to Address Z-Interference in High-Density 3D NAND Flash Memory", Electronics. 13, no. 16: 3123, (2024)
▶Hee Young Bae, Seoul Ki Hong, and Jong Kyung Park*, "Systematic Analysis of Spacer and Gate Length Scaling on Memory Characteristics in 3D NAND Flash Memory", Applied Sciences. 14, no. 15: 6689, (2024)
▶Jong Kyung Park, and Seoul Ki Hong, " A New 3-Dimensional Vertical Transistor with Channel Length Determination Using Dielectric Thickness", Electronics. 13, no. 7: 1356, (2024)
▶Jihun Kim, Nam Ki Hwang, Seul Ki Hong, Min Ju Kim and Jong Kyung Park*, "Facilitating 3D Multi-Chip Integration through Low-Temperature Polymer-to-Polymer Bonding", Acs Applied Electronic Materials, 6(5), 3915-3924.
▶Sang Woo Park, Seul Ki Hong, Sarah Eunkyung Kim, and Jong Kyung Park*, "First Demonstration of Enhanced Cu-Cu Bonding at Low Temperature with Ruthenium Passivation Layer", IEEE Access. vol.12, 82396-82401, (2024)
▶Min Seong Jeong, Sang Woo Park, Yeon Ju Kim, Jihun Kim, Seul Ki Hong, Sarah Eunkyung Kim, and Jong Kyung Park*, "Unraveling diffusion behavior in Cu-to-Cu direct bonding with metal passivation layers", Scientific Reprorts, 14, 6665 (2024).
▶ Yeeun Kim, Seoul Ki Hong, and Jong Kyung Park*, "Optimizing Confined Nitride Trap Layers for Improved Z-Interference in 3D NAND Flash Memory", Electronics. 13, no. 6: 1020, (2024)
▶ Jong Kyung Park, and Seoul Ki Hong, "Phase-Shift Controller for Analog Device Application using 2-D Material", Carbon letters, 34, 1667-1672, (2024)
2023
▶ J. K. Park, and S. K. Hong, "A Self-Aligned Process for Simultaneous Fabrication of Short Channel and Spacer in Semiconductor Devices", Journal of Semiconductor Technology and Science. 24(3), 179-183, (2023).
▶ Kim Yeon Ju, Park Sang Woo, Jung Min Seong, Kim Ji Hun and Park Jong Kyung*, "A Review on the Bonding Characteristics of SiCN for Low-temperature Cu Hybrid Bonding", Journal of the Microelectronics and Packaging Society, 30(4), 8-16 (2023).
▶ T. Y, Hong, S. E. Kim, J. K. Park, and S. K. Hong, "Guidelines for Area Ratio between Metal Lines and Vias to Improve the Reliability of Interconnect Systems in High-Density Electronic Devices" Electronics., 12(21), 4403, (2023).
2022
▶ Park, Jong Kyung*, and Sarah Eunkyung Kim. 2022. "A Review of Cell Operation Algorithm for 3D NAND Flash Memory" Applied Sciences 12, no. 21: 10697.
Prior to SeoulTech (~2021)
▶ Kim, S. Y., Park, J. K., Hwang, W. S., Lee, S. J., Lee, K. H., Pyi, S. H., & Cho, B. J. (2016). "Dependence of Grain Size on the Performance of a Polysilicon Channel TFT for 3D NAND Flash Memory". Journal of nanoscience and nanotechnology, 16(5), 5044–5048.
▶ Park, J. K., Lee, K.-H., Pyi, S. H., Lee, S.-H., & Cho,
B. J. (2014). "Improvement of the multi-level cell performance by a soft
program method in flash memory devices". Solid-State Electronics, 94,
86-90.
▶ Park J. K., Kim S.-Y., Lee K.-H., Pyi S. H., Lee S.-H., & Cho B. J. (2014) "Surface-controlled Ultrathin (2 nm) Poly-Si Channel Junctionless FET towards 3D NAND Flash Memory Applications", Symposium on VLSI Technology (VLSI), Hawaii, USA, June 9-13.
▶ Sik Hwang, W., Remskar, M., Yan, R., Kosel, T., Kyung Park, J., Jin Cho, B., Haensch, W., Xing, H., Seabaugh, A., & Jena, D. (2013). "Comparative study of chemically synthesized and exfoliated multilayer MoS2 field-effect transistors". Applied Physics Letters, 102(4).
▶ Park, J. K., Lee, S.-H., Oh, J. S., Lee, K.-H.,
Pyi, S. H., & Cho, B. J. (2012). "Improvement of Charge Retention in
Flash Memory Devices by Very Light Doping of Lanthanum into an Aluminum-Oxide
Blocking Layer". Applied Physics Express, 5(8),
081102.
▶ Park J. K., Moon D.-I., Choi Y.-K. , Lee S.-H. , Lee K.-H. , Pyi S. H. , & Cho B. J. (2012). "Origin of transient Vth shift after erase and its impact on 2D/3D structure charge trap Flash memory cell operations", International Electron Devices Meeting (IEDM), San Francisco, CA, USA, Dec. 10-12.
▶ Park, J. K., Song S. M., Mun, J. H., & Cho B. J. (2012). "Dramatic Improvement of high-K Gate Dielectric Reliability by Replacing Metal Gate Electrode with Mono-Layer Graphene", Symposium on VLSI Technology (VLSI), Hawaii, USA, Jun. 12-15.
▶ Song, S. M., Park, J. K., Sul, O. J., & Cho, B.
J. (2012). "Determination of Work Function of Graphene under a Metal
Electrode and Its Role in Contact Resistance". Nano Letters, 12(8),
3887-3892.
▶ Park, J. K., Song, S. M., Mun, J. H., & Cho, B. J.
(2011). "Graphene Gate Electrode for MOS Structure-Based Electronic
Devices". Nano Letters, 11(12), 5383-5386.
▶ Park, J. K., Park, Y., Lee, S.-H., Im, S. K., Oh,
J. S., Joo, M. S., Hong, K., & Cho, B. J. (2011).
"Lanthanum-Oxide-Doped Nitride Charge-Trap Layer for a TANOS Memory
Device". IEEE Transactions on Electron Devices, 58(10),
3314-3320.
▶ Park, J. K., Park, Y., Lee, S.-H., Lim, S. K., Oh,
J. S., Joo, M. S., Hong, K., & Cho, B. J. (2011). "Mechanism of Date
Retention Improvement by High Temperature Annealing of Al2O3 Blocking Layer in
Flash Memory Device". Japanese Journal of Applied Physics, 50(4S).
▶ Park, J. K., Park, Y., Song, M. H., Lim, S. K., Oh,
J. S., Joo, M. S., Hong, K., & Cho, B. J. (2010). "Cubic-Structured
HfLaO for the Blocking Layer of a Charge-Trap Type Flash Memory Device". Applied
Physics Express, 3(9).
▶ Park, J. K., Park, Y., Lim, S. K., Oh, J. S., Joo,
M. S., Hong, K., & Cho, B. J. (2010). "Improvement of memory
performance by high temperature annealing of the Al2O3 blocking layer in a
charge-trap type flash memory device". Applied Physics Letters, 96(22).
▶ Park, Y., Park, J. K., Song, M. H., Lim, S. K., Oh, J.
S., Joo, M. S., Hong, K., & Cho, B. J. (2010). "Structural and
compositional dependence of gadolinium-aluminum oxide for the application of
charge-trap-type nonvolatile memory devices". Applied Physics
Letters, 96(5).